Artwork Announces new MEBES Viewer

For Immediate Release

April 24, 2002

Santa Cruz, CA - Artwork Conversion is developing a new MEBES viewer and will release it in June at the Design Automation Conference in New Orleans.

MEBES is the database that drives electron beam mask writers manufactured by ETEC (now an Applied Materials company) and which is responsible for 95% of all IC masks produced worldwide. MEBEs is generally not created directly by IC layout tools - instead these layout tools create GDSII stream format which is converted (or fractured into MEBES).

The need to view MEBES files has increased as masks have become much more complex. New applications, such as optical components, do not follow the standard IC industry design rules and the process of fracturing the GDSII data into MEBES can go awry -- thus the need for the designer to review the final mask data prior to signing off on the production of the glass.

Currently available products for viewing MEBES files are extremely expensive and run only on UNIX workstations.

Artwork's new product, MBSVU, will address several issues:

    Fast and Easy to Use - MBSVU is built on the same technology as our QCKVU for GDSII - it can handle extremely large files quickly and efficiently. The user interface has been streamlined and it is very easy to pan, zoom, measure critical dimensions.

    Low Cost - currently available MEBES viewers cost upwards of $20,000 per license. Artwork's MBSVU will cost in the $5,000 - $7000 range depending on options ordered.

    Windows and UNIX Support - MBSVU will be available for Windows (NT/2000/XP) and UNIX (Solaris, HPUX) and Linux.

    Job Deck Support - MBSVU supports the many versions of the MEBES database (I/II, III, IV, V) as well as the job deck which is used to step the file across the substrate or wafer.

For more Information


Artwork Contact
Steve DiBartolomeo
Applications Manager
Steve DiBartolomeo
(831) 426-6163

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